Key components development progress updates of the 250W high power LPP-EUV light source-Reference-Cited by-同舟云学术

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Key components development progress updates of the 250W high power LPP-EUV light source

Published:2017-10-16 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2017
language:
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Author:

Yabu Takayuki,Yanagida Tatsuya,Kawasuji Yasufumi,Hori Tsukasa,Okamoto Takeshi,Tanaka Hiroshi,Watanabe Yukio,Abe Tamotsu,Kodama Takeshi,Shiraishi Yutaka,Nakarai Hiroaki,Yamazaki Taku,Itou Noritoshi,Saito Takashi,Mizoguchi Hakaru,Ishii Takuya,Miyao Kenichi

Publisher

SPIE

Reference11 articles.

1. EUV lithography;Bakshi,2009

2. Performance overview and outlook of EUV lithography systems;Pirati,2015

3. First generation laser-produced plasma source system for HVM EUV lithography;Mizoguchi,2010

4. Laser produced EUV light source development for HVM;Endo,2007

5. 100W 1st Generation Laser-Produced Plasma light source system for HVM EUV lithography;Mizoguchi,2011

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Theoretical and experimental study of nanosecond pulse amplification in a CW CO2 amplifier;Infrared Physics & Technology;2020-12

2. Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source;Applied Physics Express;2020-10-15

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