1. Dry Development Rinse Process for Ultimate Resolution Improvement via Pattern Collapse mitigation;Sayana,2015
2. Evaluation of Novel Processing Approaches to Improve Extreme Ultraviolet (EUV) Photoresist Pattern Quality;Montgomery,2015
3. Monitoring the evolution of line edge roughness during resist development using an analog of quenched flow kinetics;Sanchez,2013
4. Understanding EUV resist dissolution characteristics and its impact to RLS limitations;Fonseca,2011
5. In situCharacterization of Photoresist Dissolution