Improved multi-lot overlay performance via phase based ADI overlay measurements-Reference-Cited by-同舟云学术

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Improved multi-lot overlay performance via phase based ADI overlay measurements

Published:2022-05-26 Issue: Volume: Page:
ISSN:
Container-title:Metrology, Inspection, and Process Control XXXVI
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Author:

Lee Doogyu,Lee Jungmin,Lee Eunji,Lee Jeongjin,Lee Seung Yoon,Hwang Chan,Kapel Pieter,Yang Seung-Bin,Baek Mi-Yeon,Wefers Bettink Jeroen,Jeon Se-Ra,Kim Thomas,Soco Aileen,Zwier Olger,van Witteveen Koen

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Neural network driven sensitivity analysis of diffraction-based overlay metrology performance to target defect features;Measurement Science and Technology;2024-06-03

2. Multi-wavelength continuous-bias DBO metrology for improved ADI process-robustness;Metrology, Inspection, and Process Control XXXVIII;2024-04-10

3. Holistic Patterning to Advance Semiconductor Manufacturing in the 2020s and Beyond;2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits);2022-06-12

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