Metrology methods for quantifying edge roughness: II-Reference-Cited by-同舟云学术

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Metrology methods for quantifying edge roughness: II

Published:1999-06-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Nelson-Thomas Carla M.,Palmateer Susan C.,Forte Anthony R.,Cann Susan G.,Deneault S.,Lyszczarz Theodore M.

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Application of diluted developer solution (DDS) process to 193-nm photolithography process;SPIE Proceedings;2002-07-15

2. Study of the acid-diffusion effect on line edge roughness using the edge roughness evaluation method;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2002

3. Evaluation of aperture mask degradation in electron-beam lithography using line edge roughness of resist patterns;SPIE Proceedings;2001-09-05

4. Measurement of sidewall, line, and line-edge roughness with scanning probe microscopy;SPIE Proceedings;2001-08-22

5. Edge roughness evaluation method for quantifying at-size beam blur in electron-beam lithography;SPIE Proceedings;2000-07-21

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