Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution-Reference-Cited by-同舟云学术

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Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution

Published:2013-04-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography IV
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Author:

McIntyre Greg,Teeuwen Leon,Sohmen Erik,Wood Obert,Corliss Daniel,van den Akker Theo,Bouten Sander,van Setten Eelco,Voznyi Oleg,Han Sang-In,Bieg Hermann,Burkhardt Martin,Petrillo Karen,Qi Zhengqing John,Friz Alexander

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Defect avoidance for EUV photomask readiness at the 7 nm node;SPIE Proceedings;2016-05-10

2. Viability of pattern shift for defect-free extreme ultraviolet lithography photomasks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-02-02

3. Mitigating mask roughness via pupil filtering;SPIE Proceedings;2014-03-31

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