Output stabilization technology with chemical impurity control on ArF excimer laser-Reference-Cited by-同舟云学术

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Output stabilization technology with chemical impurity control on ArF excimer laser

Published:2000-07-05 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Sumitani Akira,Andou Satoshi,Watanabe Takehito,Konishi Masayuki,Egawa Suguru,Uchino Ikuo,Ohta Takeshi,Terashima Katsutomo,Suzuki Natsushi,Enami Tatsuo,Mizoguchi Hakaru

Publisher

SPIE

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 准分子激光光刻光源关键技术及应用;Laser & Optoelectronics Progress;2022

2. Adsorption separation of CF4, O2, CO2, and COF2 from an excimer gas mixture;Separation and Purification Technology;2021-03

3. Corrosion behavior of aluminum in fluoride-containing discharge condition for excimer laser structure application;Materials Research Express;2019-08-07

4. Corrosion behaviors of the copper alloy electrodes in ArF excimer laser operation process;High Power Laser Science and Engineering;2018

5. Elucidation of Steplike Output Energy Decrease Observed in ArF Excimer Laser for Microlithography;Japanese Journal of Applied Physics;2007-05-08

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