A parallel multibeam mask writing method and its impact on data volumes-Reference-Cited by-同舟云学术

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A parallel multibeam mask writing method and its impact on data volumes

Published:2016-10-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:32nd European Mask and Lithography Conference
language:
Short-container-title:

Author:

Chaudhary N.¹,Luo Y.¹,Savari S. A.¹

Affiliation:

1. Texas A and M Univ. (United States)

Publisher

SPIE

Reference28 articles.

1. Future mask writers requirements for the sub-10nm node era;Chandramouli,2012

2. Challenges and requirements of mask data processing for multi-beam mask writer;Choi,2015

3. Challenges and technical requirements for multi-beam mask writer development;Lee,2014

4. Principles of Lithography

5. The REBL DPG: recent innovations and remaining challenges;Carroll,2014

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Parallel compression/decompression-based datapath architecture for multibeam mask writers;33rd European Mask and Lithography Conference;2017-09-28

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