Characterization of 32nm node BEOL grating structures using scatterometry-Reference-Cited by-同舟云学术

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Characterization of 32nm node BEOL grating structures using scatterometry

Published:2008-03-14 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Zangooie Shahin,Sendelbach Matthew,Angyal Matthew,Archie Charles,Vaid Alok,Matthew Itty,Herrera Pedro

Publisher

SPIE

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral interferometry for fully integrated device metrology;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-02-21

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3. Comprehensive BEOL control using scatterometry and APC;SPIE Proceedings;2015-03-19

4. Scatterometry accuracy improvement using 3D shapes;SPIE Proceedings;2013-04-10

5. Enabling Scatterometry as an In-Line Measurement Technique for 32 nm BEOL Application;IEEE Transactions on Semiconductor Manufacturing;2011-11

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