Investigation on the effect of ambient and beam profile in annealing and texturing of amorphous silicon thin films by pulsed Nd3+:YAG laser-Reference-Cited by-同舟云学术

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Investigation on the effect of ambient and beam profile in annealing and texturing of amorphous silicon thin films by pulsed Nd3+:YAG laser

Published:2015-03-12 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Laser-based Micro- and Nanoprocessing IX
language:
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Author:

Vidhya Y. Esther B.,Vasa Nilesh J.,Sriram R.

Publisher

SPIE

Reference13 articles.

1. Advanced Renewable Energy Sources;Tiwari,2011

2. Laser crystallised poly-Si TFTs for AMLCDs

3. Large-grained polycrystalline silicon on glass by copper vapor laser annealing

4. Laser crystallization of silicon;Nickel,2003

5. Crystallization and ablation in annealing of amorphous-Si thin film on glass and crystalline-Si substrates irradiated by third harmonics of Nd3+:YAG laser

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Underwater annealing and texturing for enhancing electrical characteristics of n-aSi/p-cSi using Nd 3 + : YAG laser beam-overlap technique with a wavelength of 532 nm;Journal of Photonics for Energy;2016-03-11

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