Author:
Switkes Michael,Bloomstein Theodore M.,Kunz Roderick R.,Rothschild Mordechai,Ruberti J. W.,Shedd T. A.,Yeung Michael S.
Cited by
6 articles.
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1. Flow behavior control in immersion lithography;Flow Measurement and Instrumentation;2017-03
2. Advances in Patterning Materials for 193 nm Immersion Lithography;Chemical Reviews;2010-01-13
3. Anti-bubble topcoat for immersion lithography;SPIE Proceedings;2005-05-04
4. Simulation of air bubble scattering effects in 193 nm immersion interferometric lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005
5. Bubbles in immersion lithography;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005