The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2thin-film pairs-Reference-Cited by-同舟云学术

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The role of film interfaces in near-ultraviolet absorption and pulsed-laser damage in ion-beam-sputtered coatings based on HfO2/SiO2thin-film pairs

Published:2015-11-23 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Laser-Induced Damage in Optical Materials: 2015
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Author:

Papernov S.,Kozlov A. A.,Oliver J. B.,Smith C.,Jensen L.,Ristau D.,Günster S.,Mädebach H.

Publisher

SPIE

Reference18 articles.

1. Interface and bulk absorption of oxide layers and correlation to damage threshold at 1.06 mm,;Ristau,1986

2. Optical coating design with reduced electric field intensity

3. Interface absorption versus film absorption in HfO2 SiO2 thin-film pairs in the near-ultraviolet and the relation to pulsed-laser damage,;Papernov,2014

4. Investigations on SiO2/HfO2 mixtures for nanosecond and femtosecond pulses,;Jensen,2010

5. Optical Interference Coatings

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Optical Absorption and Photoluminescence Characteristics of Evaporated and IAD HfO2 Thin Films;Coatings;2019-05-08

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