Chip leveling and focusing with laser interferometry
Author:
Affiliation:
1. Hitachi, Ltd. (Japan)
Publisher
SPIE
Cited by 9 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography;IEEE Photonics Journal;2016-02
2. Study of the influence of the shape of projection lens focal plane on the focus control of advanced lithography;Optik;2014-11
3. A Moiré-Based Four-Channel Focusing and Leveling Scheme for Projection Lithography;IEEE Photonics Journal;2014-08
4. Interferometric Scheme for High-Sensitivity Coaxial Focusing in Projection Lithography;IEEE Photonics Journal;2014-06
5. Technology of focus detection for 193nm projection lithographic tool;SPIE Proceedings;2012-10-15
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