Hybrid scatterometry measurement for BEOL process control-Reference-Cited by-同舟云学术

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Hybrid scatterometry measurement for BEOL process control

Published:2017-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Timoney Padraig¹,Vaid Alok¹,Kang Byeong Cheol²,Liu Haibo³,Isbester Paul³,Cheng Marjorie³,Ng-Emans Susan³,Yellai Naren³,Sendelbach Matt³,Koret Roy⁴,Gedalia Oram⁴

Affiliation:

1. GLOBALFOUNDRIES Inc. (United States)

2. Nova Measuring Instruments Ltd. (United States)

3. Nova Measuring Instruments Inc. (United States)

4. Nova Measuring Instruments Ltd. (Israel)

Publisher

SPIE

Reference8 articles.

1. Comprehensive BEOL Control using Scatterometry and APC;Timoney,2015

2. Addressing thin film thickness metrology challenges of 14nm BEOL layers;Jiang,2014

3. Impact of shrinking measurement error budgets on qualification metrology sampling and cost;Sendelbach,2014

4. Complex Metrology on 3D Structures Using Multi-Channel OCD;Kagalwala,2017

5. Optical metrology strategies for inline 7nm CMOS logic product control;Lenahan,2017

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral interferometry for fully integrated device metrology;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-02-21

2. Vertical travelling scatterometry for metrology on fully integrated devices;Metrology, Inspection, and Process Control XXXVI;2022-05-26

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