Advanced applications of scatterometry based optical metrology
Author:
Affiliation:
1. GLOBALFOUNDRIES Inc. (United States)
2. Nanometrics Inc. (United States)
3. GLOBALFOUNDRIES Inc (United States)
Publisher
SPIE
Reference12 articles.
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2. Pushing the boundaries of EUV scatterometry: reconstruction of complex nanostructures for next-generation transistor technology;Metrology, Inspection, and Process Control XXXVII;2023-04-27
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4. Nanoscale limits of angular optical scatterometry;AIP Advances;2020-01-01
5. Nonconventional applications of Mueller matrix-based scatterometry for advanced technology nodes;Journal of Micro/Nanolithography, MEMS, and MOEMS;2018-08-14
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