Chalcogenide glass thin film resists for grayscale lithography-Reference-Cited by-同舟云学术

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Chalcogenide glass thin film resists for grayscale lithography

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Materials and Processing Technology XXVI
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Author:

Kovalskiy A.,Cech J.,Tan C. L.,Heffner W. R.,Miller E.,Waits C. M.,Dubey M.,Churaman W.,Vlcek M.,Jain H.

Publisher

SPIE

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural Transformations and Formation of Microstructures and Nanostructures in Thin Films of Chalcogenide Vitreous Semiconductors;Nanobiotechnology Reports;2023-12

2. Promising developments of chalcogenide nanoresists for optical, x-ray and electron beam lithography;Interexpo GEO-Siberia;2022-05-18

3. Direct surface patterning of amorphous chalcogenide layers with high- energy H+ and He+ ion beams;Journal of Materials Science: Materials in Electronics;2019-07-22

4. Fabrication and characterization of microstructures created in thermally deposited arsenic trisulfide by multiphoton lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-06-19

5. Direct surface relief formation in nanomultilayers based on chalcogenide glasses: A review;Surface Engineering and Applied Electrochemistry;2016-09

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