Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching-Reference-Cited by-同舟云学术

Fabrication of ultrahigh aspect ratio silicon nanostructures using self-assembled gold metal-assisted chemical etching

Published:2017-02-01 Issue:1 Volume:16 Page:014502
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Duran Joshua M.¹,Sarangan Andrew²

Affiliation:

1. Air Force Research Laboratory, 2241 Avionics Circle, Wright-Patterson Air Force Base, Ohio 45433, United StatesbUniversity of Dayton, Department of Electro-Optics and Photonics, 300 College Park, Dayton, Ohio 45469, United States

2. University of Dayton, Department of Electro-Optics and Photonics, 300 College Park, Dayton, Ohio 45469, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Quantum‐well infrared photodetectors

2. Small

3. Metal-assisted chemical etching in HF/H2O2 produces porous silicon

4. Metal-assisted chemical etching of silicon in HF–H2O2

5. Pore formation in silicon by wet etching using micrometre-sized metal particles as catalysts

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