AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production-Reference-Cited by-同舟云学术

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AIMSTM EUV first insertion into the back end of the line of a mask shop: a crucial step enabling EUV production

Published:2019-01-02 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2018
language:
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Author:

Capelli Renzo,Wilcox Nathan,Hellweg Dirk,Dietzel Martin,Chegwidden Scott,Rodriguez Joseph

Publisher

SPIE

Reference5 articles.

1. EUVL Readiness for High Volume Manufacturing;Turkot,2016

2. B. Kim, P. Buck, P. Morgan, T. Scherübl, T. Onoue, Panel discussion BACUS Photomasks Technology and EUV Lithography Conference 2018, Monterey, CA, USA.

3. Aerial image based metrology of EUV masks: recent achievements, status, and outlook for the AIMS EUV platform;Capelli,2018

4. To repair or not to repair: with FAVOR there is no question;Garetto,2016

5. E-beam based mask repair as door opener for defect free EUV masks;Waiblinger,2012

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Zone plate-based extreme ultraviolet mask microscope with through-pellicle imaging capability;Journal of Micro/Nanopatterning, Materials, and Metrology;2024-08-20

2. Stochastic printing behavior of ML-defects on EUV mask;International Conference on Extreme Ultraviolet Lithography 2019;2019-10-24

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