1. Correcting Image Placement Error Using Registration Control (RegC®) Technology;Graitzer,2011
2. Closed Loop Registration Control (RegC®) using PROVE® as the Data source for RegC® process;Graitzer,2012
3. RegC™: A new Registration Control process for Photomasks after Pattern Generation;Graitzer,2011
4. Photomask Registration and Overlay Metrology by means of 193 nm Optics;Klose,2008
5. Calibration strategies for precision stages in state-of-the-art registration metrology;Huebel,2009