Application of advanced hybrid metrology method to nanoimprint lithography-Reference-Cited by-同舟云学术

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Application of advanced hybrid metrology method to nanoimprint lithography

Published:2017-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Osherov Ilya¹,Issacharoff Limor¹,Gedalia Oram¹,Wakamoto Koichi²,Sendelbach Matthew³,Asano Masafumi⁴

Affiliation:

1. Nova Measuring Instruments Ltd. (Israel)

2. Nova Measuring Instruments K.K. (Japan)

3. Nova Measuring Instruments, Inc. (United States)

4. Toshiba Corp. (Japan)

Publisher

SPIE

Reference5 articles.

1. Required metrology and inspection for nanoimprint lithography;Asano,2017

2. Application of optical CD metrology for alternative lithography;Asano,2013

3. A holistic metrology approach: hybrid metrology utilizing scatterometry, CD-AFM, and CD-SEM;Vaid,2011

4. Hybrid metrology solution for 1X node technology;Vaid,2012

5. Hybrid approach to optical CD metrology of directed self-assembly lithography;Godny,2013

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Spectral interferometry for fully integrated device metrology;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-02-21

2. Vertical travelling scatterometry for metrology on fully integrated devices;Metrology, Inspection, and Process Control XXXVI;2022-05-26

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