<title>Single-component chemically amplified resist materials for electron-beam and x-ray lithography

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Single-component chemically amplified resist materials for electron-beam and x-ray lithography

Published:1991-06-01 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Advances in Resist Technology and Processing VIII
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Author:

Novembre Anthony E.,Tai Woon W.,Kometani Janet M.,Hanson James E.,Nalamasu Omkaram,Taylor Gary N.,Reichmanis Elsa,Thompson Larry F.

Publisher

SPIE

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Chemical Amplification Resists for Microlithography;Microlithography · Molecular Imprinting;2005-02-03

2. Phototriggered Acid Proliferation to Enhance Photosensitivity of Chemically Amplified Photoresists;Macromolecular Chemistry and Physics;2001-02-01

3. Environmental stability of 193 nm single layer chemically amplified resists;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

4. Recent Developments in the Chemistry of Lithography for Electronics Production;Plastics for Electronics;1999

5. Chemically Amplified Electron-Beam Photoresists;Chemistry of Materials;1996-01-01

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