Author:
Echigo Masatoshi,Hayashi Hiromi,Oizumi Hiroaki,Matsumaro Kazuyuki,Itani Toshiro
Cited by
8 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography;Journal of Photochemistry and Photobiology A: Chemistry;2024-08
2. 极紫外（EUV）光刻胶的研发;Laser & Optoelectronics Progress;2022
3. Overview of materials and processes for lithography;Materials and Processes for Next Generation Lithography;2016
4. Negative-tone organic molecular resists;Materials and Processes for Next Generation Lithography;2016
5. Development of plant-based resist materials in electron beam lithography;SPIE Proceedings;2011-03-17