1. Borodovsky, Y., “EUV lithography at Insertion and Beyond”, presented at 2012 International Workshop on EUV Lithography, www.euvlitho.com/2012/P1.pdf.
2. Single lithography exposure edge placement model;Tyminski,2015
3. Overlay and edge placement control strategies for the 7 nm node using EUV and ArF lithography;Mulkens,2015
4. Contour-Based Metrology for Complex 2D Shaped Patterns Printed by Multiple-Patterning Process;Fuchimoto,2014
5. A Generalized Edge-Placement Yield Model for the Cut-Hole Patterning Process;Zhang,2014