1. Holistic approach for overlay and edge placement error to meet the 5nm technology node requirements;Jan,2018
2. Multi-wavelength approach towards on-product overlay accuracy and robustness;Bhattacharyya,2018
3. A complete methodology towards accuracy and lot-to-lot robustness in on-product overlay metrology using flexible wavelength selection;Bhattacharyya,2017
4. Improving on-product performance at litho using integrated diffraction-based metrology and computationally designed device-like targets fit for advanced technologies (incl. FinFET);Chen,2014
5. A study of swing-curve physics in diffraction-based overlay;Bhattacharyya,2016