ASML NXE pellicle update

Author:

Brouns Derk,Broman Par,van der Horst Jan-Willem,Lafarre Raymond,Maas Raymond,Modderman Theo,Notermans Roel,Salmaso Guido

Publisher

SPIE

Reference4 articles.

1. Ivan Pollentier, “EUV lithography imaging using novel pellicle membranes”, Proceedings of SPIE 9776–72

2. Development and performance of EUV pellicles

3. Researching new EUV pellicle films for source powers beyond 250 watts

4. Mark van de Kerkhof, Advanced particle contamination control in EUV scanners: reticle defectivity, Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570U

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1. Actinic patterned mask inspection for high-NA EUV lithography;Optical and EUV Nanolithography XXXVII;2024-04-10

2. Comparative Study of the Thermal Stability of Be-Based Extreme Ultraviolet Pellicles;Technical Physics;2023-12

3. Actinic pattern mask inspection for high-NA EUV lithography;Photomask Technology 2023;2023-11-21

4. Enhanced Thermal Conductivity of Free-Standing Double-Walled Carbon Nanotube Networks;ACS Applied Materials & Interfaces;2023-10-27

5. Actinic patterned mask inspection for EUV lithography;Photomask Japan 2023: XXIX Symposium on Photomask and Next-Generation Lithography Mask Technology;2023-09-29

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