1. EUVL ML mask blank fiducial mark application for ML defect mitigation;Yan,2009
2. EB alignment function for defect mitigation of EUV blank;Yoshitake,2012
3. EUVL multilayer mask blank defect mitigation for defect-free EUVL mask fabrication;Yan,2012
4. Development of fiducial marks on EUV blanks for defect mitigation process;Onoue,2012
5. Using pattern shift to avoid blank defects during EUVL mask fabrication;Negishi,2013