Towards ultimate image placement accuracy for EUV mask writing with pattern shift process

Author:

Sidorkin Vadim,Zimmermann Stephan,Proske Stefan,Finken Michael,Cantrell G. R.,Bender Markus

Publisher

SPIE

Reference8 articles.

1. EUVL ML mask blank fiducial mark application for ML defect mitigation;Yan,2009

2. EB alignment function for defect mitigation of EUV blank;Yoshitake,2012

3. EUVL multilayer mask blank defect mitigation for defect-free EUVL mask fabrication;Yan,2012

4. Development of fiducial marks on EUV blanks for defect mitigation process;Onoue,2012

5. Using pattern shift to avoid blank defects during EUVL mask fabrication;Negishi,2013

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