EUV mask polarization effects-Reference-Cited by-同舟云学术

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EUV mask polarization effects

Published:2019-09-26 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2019
language:
Short-container-title:

Author:

Neim Lilian,Smith Bruce

Publisher

SPIE

Reference13 articles.

1. Mask-induced polarization effects at high numerical aperture

2. Handbook of optical systems, 467, Wiley-VCH, Weinheim;Gross,2005

3. Challenges in high NA, polarization, and photoresists

4. Uneven Distribution of Light in a Diffraction Grating Spectrum, Philosophical Magazine;Wood,1902

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 3D EUV mask simulator based on physics-informed neural networks: effects of polarization and illumination;Computational Optics 2024;2024-06-17

2. Hyper NA EUV lithography: an imaging perspective;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-11-14

3. Simulation study on EUV multilayer polarization effects;Computational Optics 2021;2021-09-21

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