Current development status of HSFET (High NA Small Field Exposure Tool) in EIDEC

Author:

Tanaka Satoshi1,Magoshi Shunko1,Kawai Hidemi1,Inoue Soichi1,Rosenthal Wylie2,Girard Luc2,Marchetti Lou2,Kestner Bob2,Kincade John2

Affiliation:

1. EUVL Infrastructure Development Ctr., Inc. (Japan)

2. Zygo Corp. (United States)

Publisher

SPIE

Reference19 articles.

1. EUV Microexposure Tool (MET) for near-term development using a high NA projection system;Taylor,2000

2. E-D characteristics and aberration sensitivity of the Microexposure Tool (MET);Hudyma,2000

3. High-resolution EUV Microstepper tool for resist testing & technology evaluation;Brunton,2004

4. Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic;Naulleau,2004

5. Lithographic performance of high-numerical aperture(NA=0.3) EUV small-field exposure tool (HINA);Oizumi,2005

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