Author:
Kojima A.,Ikegami N.,Yoshida T.,Miyaguchi H.,Muroyama M.,Yoshida S.,Totsu K.,Koshida N.,Esashi M.
Reference7 articles.
1. MAPPER: High throughput maskless lithography;Slot,2008
2. REBL: design progress toward 16 nm half-pitch maskless projection electron beam lithography;McCord,8323
3. Development of Ballistic Hot Electron Emitter amd its Applications to Parallel Processing: Active-Matrix Massive Direct-Write Lithography in Vacuum and Thin Films Deposition in Solutions;Koshida,9423
4. Cold Electron Emission from Electroluminescent Porous Silicon Diodes
5. Development of massively parallel electron beam direct write lithography using active-matrix nanocrystalline-silicon electron emitter arrays
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