Understanding EUV-induced plasma and application to particle contamination control in EUV scanners
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SPIE
Cited by 23 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Vacuum cleaning of amorphous carbon using hydrogen plasma for EUV lithography;Materials Science and Engineering: B;2024-09
2. Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography;Journal of Vacuum Science & Technology B;2024-08-30
3. Particle mobilization by EUV-induced plasma and fast electrons;Optical and EUV Nanolithography XXXVII;2024-04-10
4. Extreme ultraviolet lithography reaches 5 nm resolution;Nanoscale;2024
5. Physics and applications of dusty plasmas: The Perspectives 2023;Physics of Plasmas;2023-12-01
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