Contact hole reticle optimization by using interference mapping lithography (IML)-Reference-Cited by-同舟云学术

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Contact hole reticle optimization by using interference mapping lithography (IML)

Published:2004-08-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Socha Robert J.,Van Den Broeke Douglas J.,Hsu Stephen D.,Chen J. Fung,Laidig Thomas L.,Corcoran Noel P.,Hollerbach Uwe,Wampler Kurt E.,Shi Xuelong,Conley Willard E.

Publisher

SPIE

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Source mask optimization using real-coded genetic algorithms;SPIE Proceedings;2013-04-12

2. Wavefront-based pixel inversion algorithm for generation of subresolution assist features;Journal of Micro/Nanolithography, MEMS, and MOEMS;2011-10-01

3. Pixelated source mask optimization for process robustness in optical lithography;Optics Express;2011-09-22

4. Circular apertures for contact hole patterning in 193 nm immersion lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-03

5. Fundamental Study of the Mask Topography Effect on the Advanced Phase-Shifting Masks for Next-Generation Lithography;Japanese Journal of Applied Physics;2010-06-21

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