Monte Carlo study of the influence of electron beam focusing to SEM linewidth measurement-Reference-Cited by-同舟云学术

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Monte Carlo study of the influence of electron beam focusing to SEM linewidth measurement

Published:2013-05-29 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Scanning Microscopies 2013: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
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Author:

Zhang P.,Mao S. F.,Zhang Z. M.,Ding Z. J.

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Relation Between Electron Yield and Temperature: Exploring a Novel Route to Measure the Nanoscale Temperature;Brazilian Journal of Physics;2023-03-08

2. Study on the temperature effect on line-scan profile of nanorods under electron irradiation;Physica Scripta;2022-12-06

3. Edge determination improvement of scanning electron microscope images by inpainting and anisotropic diffusion for measurement and analysis of microstructures;Measurement;2021-05

4. Monte Carlo study for correcting the broadened line‐scan profile in scanning electron microscopy;Journal of Microscopy;2020-01

5. Monte Carlo Simulation on the CD-SEM Images of SiO2/Si Systems;Microscopy and Microanalysis;2019-05-03

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