Second generation fluids for 193nm immersion lithography-Reference-Cited by-同舟云学术

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Second generation fluids for 193nm immersion lithography

Published:2006-03-10 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

French Roger H.,Qiu Weiming,Yang Min K.,Wheland Robert C.,Lemon Michael F.,Shoe Aaron L.,Adelman Doug J.,Crawford Michael K.,Tran Hoang V.,Feldman Jerald,McLain Steve J.,Peng Sheng

Publisher

SPIE

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Advances in Patterning Materials for 193 nm Immersion Lithography;Chemical Reviews;2010-01-13

2. Fluid-photoresist interactions and imaging in high-index immersion lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2009-07-01

3. Index of refraction of high-index lithographic immersion fluids and its variability;Journal of Micro/Nanolithography, MEMS, and MOEMS;2009-04-01

4. High refractive index nanoparticle fluids for 193-nm immersion lithography;Advances in Resist Materials and Processing Technology XXVI;2009-03-13

5. High Refractive Index Fluid Evaluations at 193nm: Fluid Lifetime and Fluid/Resist Interaction Studies;Journal of Photopolymer Science and Technology;2008

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