Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics-Reference-Cited by-同舟云学术

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Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Published:2004-05-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Oshino Tetsuya,Yamamoto Takahiro,Miyoshi Tatsuro,Shiraishi Masayuki,Komiya Takaharu,Kandaka Noriaki,Kondo Hiroyuki,Mashima Kiyoto,Nomura Kazushi,Murakami Katsuhiko,Oizumi Hiroaki,Nishiyama Isa,Okazaki Shinji

Publisher

SPIE

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. CURRENT ISSUES AND FUTURE PROSPECTS OF LITHOGRAPHY;Frontiers in Electronics;2006-08

2. Printability of contact-hole patterns in EUVL using 0.3-NA HiNA optics;SPIE Proceedings;2006-03-10

3. Evaluation of pattern fidelity in EUVL using a high-numerical-aperture small-field EUV exposure tool (HiNA);SPIE Proceedings;2005-05-06

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