1. International Semiconductor Roadmap for Semiconductors, 2003 ed., ITRS 2005 activities, see http://public.itrs.net/HomeStart.htm.
2. B. Lin , “The ending of optical lithography and the prospects of its successors,”Proc. MNE 2005, Sept. 19–22, 2005, Vienna, Austria.
3. R. P. Feynman , “There’s plenty of room at the bottom—An invitation to enter a new field of physics,” see http://www.zyvex.com/nanotech/feynman.html.
4. Applications of focused ion beams
5. H. Loeschner , “E-beam mask-less nanolithography and ion-beam nanofabrication,” at EIPBN’2004, June 1–4, 2004, San Diego, CA.