Ultralow <inline-formula><math display="inline" overflow="scroll"><msub><mi>k</mi><mn>1</mn></msub></math></inline-formula> oxide contact hole formation and metal filling using resist contact hole pattern by double line and space formation method
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Published:2008-10-01
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ISSN:1932-5150
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Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
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