193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system
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SPIE
Cited by 52 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Photoresists and Advanced Patterning;Polymer Science: A Comprehensive Reference;2012
2. Evaluating resist degradation during reactive ion oxide etching using 193 nm model resist formulations;SPIE Proceedings;2006-03-10
3. Chemical Amplification Resists for Microlithography;Microlithography · Molecular Imprinting;2005-02-03
4. Liquid immersion lithography: evaluation of resist issues;SPIE Proceedings;2004-05-14
5. A novel photoacid generator for chemically amplified photoresist with ArF exposure;Advances in Resist Technology and Processing XX;2003-06-11
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