1. Resolution, overlay, and field size for lithography systems
2. Trajectory planning and control method for wafer stage exchange process of dual-stage lithography[J].;Zhipeng,2013
3. Recent Development of International Mainstream Lithographic Tools[J].;Qiongyan,2007
4. The performance advantages of a dual stage system[J].;Boonman,2004
5. Mu Haihua, Zhou Yunfei, Zhou Yanhong, Coupling mechanism analysis and dynamic modeling for Lorentz motor motion control[J]. Proceedings of the CSEE. 29(15):95-100.