Author:
Ohta Hiroya,Someda Yasuhiro,Sohda Yasunari,Saitou Norio,Katoh Shin-ichi,Itoh Hiroyuki
Cited by
2 articles.
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1. E-Beam Mask Writers;Handbook of Photomask Manufacturing Technology;2005-04-07
2. Technologies for electron-beam reticle writing systems for 130-nm node and below;21st Annual BACUS Symposium on Photomask Technology;2002-03-11