1. Principle of Lithography;Levinson,2005
2. Integration of dry etching steps for double patterning and spacer patterning processes;Barnola,2009
3. ITRS 2013 Roadmap
4. Technological merits, process complexity, and cost analysis of self-aligned multiple patterning;Chen,2012
5. Patterning challenges of EUV lithography for 1X-nm node DRAM and beyond;Eom,2013