1. Novel concept for ultraprecise and fast measurment of nanotography of large wafers;Weingärtner,2002
2. Curvature measurement system of Si-wafer using Cirular Gratings;Ng,2012
3. Warpage of thin wafers using computer aided reflection moiré method;Ng,2007
4. Practical methods for retrace error correction in nonnull aspheric testing
5. Deflectometry vs. Interferometry;Häusler,2013