Sub-aperture EUV collector with dual-wavelength spectral purity filter-Reference-Cited by-同舟云学术

Sub-aperture EUV collector with dual-wavelength spectral purity filter

Published:2015-03-16 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
Short-container-title:

Author:

Feigl Torsten,Perske Marco,Pauer Hagen,Fiedler Tobias,Zeitner Uwe,Leitel Robert,Eckstein Hans-Christoph,Schleicher Philipp,Schröder Sven,Trost Marcus,Risse Stefan,Steinkopf Ralf,Scholze Frank,Laubis Christian

Publisher

SPIE

Reference10 articles.

1. Performance optimization of MOPA prepulse LPP light source;Schafgans,2015

2. Performance of one hundred watt HVM LPP-EUV Source;Mizoguchi,2015

3. Rapidly solidified aluminium for optical applications;Gubbels,2008

4. Metal Mirrors with Excellent Figure and Roughness;Steinkopf,2008

5. NiP Plated Mirrors for Astronomy and Space;Risse,2007

Cited by 12 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High efficiency polishing of micro-structured NiP alloy using isotropic electrochemical etching for achieving sub-nanometer roughness;Journal of Manufacturing Processes;2024-07

2. Spectral purity systems applied for laser-produced plasma extreme ultraviolet lithography sources: a review;High Power Laser Science and Engineering;2023

3. Cryogenic cleaning of tin-drop contamination on surfaces relevant for extreme ultraviolet light collection;Journal of Vacuum Science & Technology B;2020-11

4. Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source;Applied Physics Express;2020-10-15

5. Compensation for general asymmetric static loads for a complete optical system of freeform mirrors;Applied Optics;2020-02-11