Source for extreme ultraviolet lithography by the tabletop storage ring MIRRORCLE-Reference-Cited by-同舟云学术

Source for extreme ultraviolet lithography by the tabletop storage ring MIRRORCLE

Published:2008-10-01 Issue:4 Volume:7 Page:043004
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Yamada Hironari

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference23 articles.

1. Sematech Organization , www.sematech.org/meetings/announcements/8285.

2. V. Bakshi ,EUV Sources for Lithography, pp. 4–8, SPIE Press, Bellingham, WA (2006).

3. G. Denbeaux, Y.-J. Fan, A. Antohe, L. Yankulin, R. Garg, O. Wood, F. Goodwin, C.-S. Koay, K. Goldberg, E. Anderson, and W. Chao , “Actinic microscope for EUV masks using a Stand-Alone Source for Imaging and Contamination Studies of EUV masks,” presented at Session of Optics and Metrology, 2007 International Extreme Ultraviolet Lithography (EUVL) Symposium, 29–31 October 2007, Sapporo, Japan, Presentation Number ME-02.

4. A. Wuest and K. Dean , “Implications of EUV optics lifetime and contamination mitigation studies,” presented at Session of Contamination and Cleanness, 2007 International Extreme Ultraviolet Lithography (EUVL) Symposium, 29–31 October 2007, Sapporo, Japan, Presentation Number CC-P04.

5. M. Goldstein, S. H. Lee, Y. A. Shroff, P. J. Silverman, D. Williams, H. Park, M. A. Piestrup, and R. H. Pantell , “FEL applications in EUV lithography,” presented at 27th International Free Electron Laser Conference, 21–26 August 2005, Stanford, CA, Paper No. C0508213.

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1. Tabletop Synchrotron Light Source;Comprehensive Biomedical Physics;2014

2. Tabletop storage ring MIRRORCLE extreme ultraviolet lithography source;Journal of Micro/Nanolithography, MEMS, and MOEMS;2012-05-29

3. The TPLUS project : a table-top tunable parametric UV radiation source;Journal of Physics: Conference Series;2012-05-03

4. Characterization of a novel x-ray source: The MIRRORCLE-6X system;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;2012-02

5. Measurement of angular distribution of soft X-ray radiation from thin targets in the tabletop storage ring MIRRORCLE-20SX;Journal of Synchrotron Radiation;2011-07-16