Impacts of SiO2 planarization on optical thin film properties and laser damage resistance-Reference-Cited by-同舟云学术

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Impacts of SiO2 planarization on optical thin film properties and laser damage resistance

Published:2016-12-06 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Day T.¹,Wang H.¹,Jankowska E.¹,Reagan B. A.¹,Rocca J. J.¹,Stolz C. J.²,Mirkarimi P.²,Folta J.²,Roehling J.²,Markosyan A.³,Route R. R.³,Fejer M. M.³,Menoni C. S.¹

Affiliation:

1. Colorado State Univ. (United States)

2. Lawrence Livermore National Lab. (United States)

3. Stanford Univ. (United States)

Publisher

SPIE

Reference25 articles.

1. Nodular defects in dielectric multilayers and thick single layers

2. Comparison of nodular defect seed geometries from different deposition techniques;Stolz,1996

3. Laser damage study of nodules in electron-beam-evaporated HfO_2/SiO_2 high reflectors

4. Nanosecond laser-induced damage of nodular defects in dielectric multilayer mirrors [Invited]

5. Modeling of electric-field enhancement at nodular defects in dielectric mirror coatings

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Laser induced damage in coatings for cryogenic Yb:YAG active mirror amplifiers;Optics Letters;2020-08-07

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