Author:
Cho Wonil,Kearney Patrick A.,Gullikson Eric M.,Jia Anwei,Tamura Tomoya,Tajima Atsushi,Kusunose Hal,Jeon Chan-Uk
Cited by
9 articles.
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1. Detection system of multilayer coating microstructure defects based on differential interference contrast confocal microscopy;Chinese Optics;2018
2. Improvement of defects and flatness on extreme ultraviolet mask blanks;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-04-01
3. Analytical and experimental evaluation of a counting method for particles added during the mask handling process;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-05
4. Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11
5. Actinic Phase Defect Detection for Extreme Ultraviolet Lithography Mask with Absorber Patterns;Japanese Journal of Applied Physics;2010-06-21