Research on focusing technique based on dual-phase lock-in amplifier in 193nm lithography system
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Published:2010-05-13
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ISSN:0277-786X
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Container-title:5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems
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Author:
Xie Fei,Tang Xiaoping,Hu Song,Yan Wei