Investigation on gas medium parameters for an ArF excimer laser through orthogonal experimental design-Reference-Cited by-同舟云学术

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Investigation on gas medium parameters for an ArF excimer laser through orthogonal experimental design

Published:2018-02-15 Issue: Volume: Page:
ISSN:
Container-title:Solid State Lasers XXVII: Technology and Devices
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Author:

Yang Junhong,Xiong Guangliang,Wang Yu,Song Xingliang,Sha Pengfei,Fan Yuanyuan,Zhou Yi,Zhao Jiangshan,Jiang R

Publisher

SPIE

Reference13 articles.

1. Neon reduction program on Cymer ArF light sources;Kanawade,2016

2. Analysis on factors affecting energy stability of excimer laser for lithography;Shi,2014

3. Ultrahigh-repetition-rate ArF excimer laser with long pulse duration for 193-nm lithography;Kakizaki,2001

4. Dual-chamber ultra line-narrowed excimer light source for 193nm lithography;Fleurov,2003

5. A quality study on the excimer laser micromachining of electro-thermal-compliant micro devices

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1. Effects of tunable circuit parameters on pulsed discharge and input-output characteristics of a XeCl excimer laser;Journal of Physics D: Applied Physics;2024-01-04

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