1. Source imperfection impacts on optical proximity correction
2. Impact of acid quencher behavior on lithography performance;Fukuda,2001
3. Approximate models for resist processing effects;Brunner,1996
4. Performance of a Programmable Illuminator for generation of Freeform Sources on high NA immersion systems;Mulder,2009
5. Wafer-scale micro-optics fabrication;Voelkel,2012