Asymmetry overlay correction for lithography processes-Reference-Cited by-同舟云学术

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Asymmetry overlay correction for lithography processes

Published:2017-03-28 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Chen Ming-Jui¹,Yu Chun-Chi¹,Weng Tang Chun¹,Chang C.-H.¹,Chen Charlie¹,Lin Chia Ching¹,Lio En Chuan¹,Yu Chia Hsiang²

Affiliation:

1. United Microelectronics Corp. (Taiwan)

2. Kernel System Corp. (Taiwan)

Publisher

SPIE

Reference3 articles.

1. Advanced Modeling Strategies to Improve Overlay Control for 32nm Lithography Processes;Eichelberger,2009

2. Sampling Strategy: Optimization and Correction for High Order Overlay Control for 45nm Process Node;Hsueh,2009

3. Automated Optimized Overlay Sampling for High-Order Processing in Double Patterning Lithography;Koay,2010

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