Hemicellulose block copolymers made from woods for wide-range directed self-assembly lithography enabling wider range of applicable patterning size
Author:
Affiliation:
1. Oji Holdings Corp. (Japan)
Publisher
SPIE
Reference9 articles.
1. Advances in Patterning Materials and Processes XXXIII;Takei,2016
2. Synthesis and Thin-film Self-assembly of Cylinder-Forming High-χ Block Copolymers
3. Advances in Patterning Materials and Processes XXXIII;Hirahara,2016
4. Synthesis and Characterization of Si-containing Block Co-polymers with Resolution beyond 10 nm
5. Development of Sub-5 nm Patterning by Directed Self-Assembly using Multiblock Copolymers
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