1. Overlay run-to-run control based on device structure measured overlay in DRAM HVM;Chu,2019
2. On-scanner high-spatial-frequency overlay control using a distortion manipulator;Klinkhamer,2022
3. A new registration control process for photomasks after pattern generation;Graitzer,2011
4. Multi-layer overlay metrology on any shape pattern, including devices, by high voltage scanning electron microscope;Eyring,2022
5. Die-level nano-topography metrology to characterize the stress-induced inplane distortion contribution to overlay;Balan,2023